Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas anneal

Electron-enhanced SiO2 atomic layer deposition at 35 °C using disilane and ozone or water as reactants

(2023) Jonas C. Gertsch et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

The Importance of Decarbonylation Mechanisms in the Atomic Layer Deposition of High‐Quality Ru Films by Zero‐Oxidation State Ru(DMBD)(CO) 3

(2022) Joel R. Schneider et al.   Small

Electron-Enhanced Atomic Layer Deposition of Titanium Nitride Films Using an Ammonia Reactive Background Gas

(2022) Zachary C. Sobell et al.   CHEMISTRY OF MATERIALS

Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica

(2021) Marcel Junige et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition

(2021) Zachary C. Sobell et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Improved properties of atomic layer deposited ruthenium via postdeposition annealing

(2021) Michael Hayes et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

The search for the most conductive metal for narrow interconnect lines

(2020) Daniel Gall   JOURNAL OF APPLIED PHYSICS

Electron beam-induced deposition of platinum from Pt(CO)2Cl2 and Pt(CO)2Br2

(2020) Aya Mahgoub et al.   Beilstein Journal of Nanotechnology

Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water

(2019) Zhengning Gao et al.   CHEMISTRY OF MATERIALS

Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons

(2019) Zachary C. Sobell et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Thermal atomic layer deposition of ruthenium metal thin films using nonoxidative coreactants

(2019) Stefan Cwik et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Electron-Enhanced Atomic Layer Deposition of Boron Nitride Thin Films at Room Temperature and 100 °C

(2018) Jaclyn K. Sprenger et al.   Journal of Physical Chemistry C

Electron-enhanced atomic layer deposition of silicon thin films at room temperature

(2018) Jaclyn K. Sprenger et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

3D system integration on 300 mm wafer level: High-aspect-ratio TSVs with ruthenium seed layer by thermal ALD and subsequent copper electroplating

(2018) Sebastian Killge et al.   MICROELECTRONIC ENGINEERING

Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum

(2017) Marcel Junige et al.   NANOTECHNOLOGY

Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100 °C Using Sequential Surface Reactions

(2016) Jaclyn K. Sprenger et al.   CHEMISTRY OF MATERIALS

In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition

(2012) Marion Geidel et al.   MICROELECTRONIC ENGINEERING

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

(2011) Kaupo Kukli et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

(2011) Martin Knaut et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Cross Sections for Electron Collisions with Hydrogen Molecules

(2008) Jung-Sik Yoon et al.   JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA

Survey of methods to characterize thin absorbing films with Spectroscopic Ellipsometry

(2008) James N. Hilfiker et al.   THIN SOLID FILMS