期刊
MICROSCOPY AND MICROANALYSIS
卷 22, 期 3, 页码 520-535出版社
CAMBRIDGE UNIV PRESS
DOI: 10.1017/S1431927616000738
关键词
electron beam X-ray microanalysis; energy-dispersive X-ray spectrometry; scanning electron microscopy; silicon drift detector; trace analysis
Electron-excited X-ray microanalysis performed with scanning electron microscopy and energy-dispersive spectrometry (EDS) has been used to measure trace elemental constituents of complex multielement materials, where trace refers to constituents present at concentrations below 0.01 (mass fraction). High count spectra measured with silicon drift detector EDS were quantified using the standards/matrix correction protocol embedded in the NIST DTSA-II software engine. Robust quantitative analytical results for trace constituents were obtained from concentrations as low as 0.000500 (mass fraction), even in the presence of significant peak interferences from minor (concentration 0.01 <= C <= 0.1) and major (C > 0.1) constituents. Limits of detection as low as 0.000200 were achieved in the absence of peak interference.
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