Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning

标题
Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning
作者
关键词
Helium ion beam lithography, Helium ion microscope, Fullerene, Molecular resist, Nanolithography, Next-generation lithography
出版物
MICROELECTRONIC ENGINEERING
Volume 155, Issue -, Pages 74-78
出版商
Elsevier BV
发表日期
2016-02-26
DOI
10.1016/j.mee.2016.02.045

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