期刊
MACROMOLECULES
卷 49, 期 21, 页码 8162-8166出版社
AMER CHEMICAL SOC
DOI: 10.1021/acs.macromol.6b01894
关键词
-
资金
- MRSEC program of the National Science Foundation [DMR 1121053]
- Dow Chemical Company through the Dow Materials Institute at UCSB
- PREM program of the National Science Foundation [DMR-1205194]
- NSF
- Alexander von Humboldt Foundation
- NIH [F32GM108323]
- Postdoc-Program of the German Academic Exchange Service (DAAD)
- Research Internships in Science and Engineering (RISE-UCSB MRSEC) program
A light-mediated method for the facile removal of polymer end groups that are common to controlled radical polymerization techniques is presented. This metal-free strategy is general, being effective for chlorine, bromine, and thiocarbonylthio moieties as well as a number of different polymer families (styrenic, acrylic, and methacrylic). In addition to solution reactions, this process is readily translted to thin films, where light mediation allows the straightforward fabrication of hierarchically patterned polymer brushes.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据