期刊
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
卷 163, 期 7, 页码 C369-C376出版社
ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.1081607jes
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资金
- National Natural Science Foundation of China [51301214, 51541102, 51275037]
- Fundamental and Cutting-edge Research Plan of Chongqing [cstc2013jcyjA50017]
- EPSRC LATEST2 Program Grant
- Engineering and Physical Sciences Research Council [EP/H020047/1] Funding Source: researchfish
- EPSRC [EP/H020047/1] Funding Source: UKRI
The effect of anodization temperature and tartaric acid concentration on the morphology and corrosion resistance of the anodic film formed on AA2099-T8 alloy in tartaric-sulfuric acid was investigated. It was found that the dissolution of the anodic film during anodizing led to increased pore size, rod-shaped cavities and grain boundary grooves in the anodic films. The rod-shaped cavities and grain boundary grooves are associated with selective dissolution of the anodic film formed from fine T-1 (Al2CuLi) phase precipitates due to the difference in the reactivity of the films formed from different phases. The increased porosity due to dissolution degraded the corrosion resistance of the anodic film. In the temperature range of 22-47 degrees C, with 0.53 M tartaric acid addition, anodizing at 42 degrees C provided the best corrosion performance and a relatively high anodizing efficiency; in the tartaric acid concentration range of 0-0.9 M, at 37 degrees C, anodizing in electrolytes containing 0.7 and 0.9 M tartaric acid provided good corrosion resistance with little decrease of anodizing efficiency. The corrosive medium did not penetrate the anodic film uniformly but preferentially at local sites, resulting in localized corrosion of the anodized alloy. (C) The Author(s) 2016. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse of the work in any medium, provided the original work is properly cited. All rights reserved.
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