An innovative approach to photolithography for optical recording of high-resolution two-dimensional structures in a negative SU8 photoresist by activation of up-conversion luminescence in Yb3+ and Tm3+ doped NaYF4 nanoparticles

标题
An innovative approach to photolithography for optical recording of high-resolution two-dimensional structures in a negative SU8 photoresist by activation of up-conversion luminescence in Yb3+ and Tm3+ doped NaYF4 nanoparticles
作者
关键词
-
出版物
Nano-Structures and Nano-Objects
Volume 33, Issue -, Pages 100932
出版商
Elsevier BV
发表日期
2022-12-16
DOI
10.1016/j.nanoso.2022.100932

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