4.8 Article

Inferring topological transitions in pattern-forming processes with self-supervised learning

期刊

NPJ COMPUTATIONAL MATERIALS
卷 8, 期 1, 页码 -

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NATURE PORTFOLIO
DOI: 10.1038/s41524-022-00889-2

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资金

  1. USC-ISI
  2. Sandia National Laboratories
  3. BeyondFingerprinting Sandia Grand Challenge Laboratory Directed Research and Development (GC LDRD) program
  4. Center for Integrated Nanotechnologies (CINT), an Office of Science user facility operated for the U.S. Department of Energy
  5. U.S. Department of Energy National Nuclear Security Administration [DE-NA0003525]

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This study presents a self-supervised neural network approach that can predict process parameters in microstructures and uncover microstructural transitions without predefined labels. By automatically discovering microstructural transitions in different pattern-forming processes, the effectiveness of this approach is demonstrated.
The identification of transitions in pattern-forming processes are critical to understand and fabricate microstructurally precise materials in many application domains. While supervised methods can be useful to identify transition regimes, they need labels, which require prior knowledge of order parameters or relevant microstructures describing these transitions. Instead, we develop a self-supervised, neural-network-based approach that does not require predefined labels about microstructure classes to predict process parameters from observed microstructures. We show that assessing the difficulty of solving this inverse problem can be used to uncover microstructural transitions. We demonstrate our approach by automatically discovering microstructural transitions in two distinct pattern-forming processes: the spinodal decomposition of a two-phase mixture and the formation of binary-alloy microstructures during physical vapor deposition of thin films. This approach opens a path forward for discovering unseen or hard-to-discern transitions and ultimately controlling complex pattern-forming processes.

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