Synthesis of Zn-doped colloidal SiO2 abrasives and their applications in sapphire chemical mechanical polishing slurry

Preparation of Cu-doped colloidal SiO2 abrasives and their chemical mechanical polishing behavior on sapphire substrates

(2015) Hong Lei et al.   JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

The Effect of pH on Sapphire Chemical Mechanical Polishing

(2015) W. Yan et al.   ECS Journal of Solid State Science and Technology

Synthesis of non-rigid core–shell structured PS/SiO2 composite abrasives and their oxide CMP performance

(2012) Weibin Mu et al.   MICROELECTRONIC ENGINEERING

Preparation of porous Fe2O3/SiO2 nanocomposite abrasives and their chemical mechanical polishing behaviors on hard disk substrates

(2012) Hu Li et al.   THIN SOLID FILMS

Preparation of monodisperse polystyrene/silica core–shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper

(2011) Lei Zhang et al.   APPLIED SURFACE SCIENCE

Synthesis of Fe metal precipitated colloidal silica and its application to W chemical mechanical polishing (CMP) slurry

(2010) Young-Jae Kang et al.   JOURNAL OF COLLOID AND INTERFACE SCIENCE

Two-Step Chemical Mechanical Polishing of Sapphire Substrate

(2010) Zefang Zhang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Planarization machining of sapphire wafers with boron carbide and colloidal silica as abrasives

(2009) XiaoKai Hu et al.   APPLIED SURFACE SCIENCE

Preparation of silica/ceria nano composite abrasive and its CMP behavior on hard disk substrate

(2009) Hong Lei et al.   MICROELECTRONIC ENGINEERING

Composite Polymer Core–Silica Shell Abrasives: The Effect of the Shape of the Silica Particles on Oxide CMP

(2008) S. Armini et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY