期刊
CARBON
卷 92, 期 -, 页码 305-310出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.carbon.2015.04.046
关键词
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资金
- AFOSR [FA-9550-12-10069]
- DOD-Army [W911NF-11-1-0209]
- NSF [CMMI-1400274, IIP-1343270]
- NSFC-NSF [DMR-1106160]
- CWRU-WMU [CON115346]
- NSFC [51202167]
- Thousand Talents Program of China
- Directorate For Engineering
- Div Of Civil, Mechanical, & Manufact Inn [1363123, 1400274] Funding Source: National Science Foundation
- Directorate For Engineering
- Div Of Industrial Innovation & Partnersh [1343270] Funding Source: National Science Foundation
A simple and facile method for multiscale, in-plane patterning of graphene oxide and reduced graphene oxide (GO-rGO) was developed by region-specific reduction of graphene oxide (GO) under a mild irradiation. The UV-induced reduction of graphene oxide was monitored by various spectroscopic techniques, including optical absorption, X-ray photoelectron spectroscopy (XPS), Raman, and X-ray diffraction (XRD), while the resultant GO-rGO patterned film morphology was studied on optical microscope, scanning electron microscope (SEM), and atomic force microscope (AFM). Flexible symmetric and in-plane supercapacitors were fabricated from the GO-rGO patterned polyethylene terephthalate (PET) electrodes to show capacitances up to 141.2 F/g. (C) 2015 Elsevier Ltd. All rights reserved.
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