4.4 Article

Deposition of thermoelectric strontium hexaboride thin films by a low pressure CVD method

期刊

JOURNAL OF CRYSTAL GROWTH
卷 449, 期 -, 页码 10-14

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2016.05.030

关键词

Borides; Strontium compounds; Thermoelectric; Chemical vapor deposition processes

资金

  1. Japan Society for the Promotion of Science (JSPS) under the JSPS Postdoctoral Fellowship for Foreign Researchers program
  2. CREST, JST

向作者/读者索取更多资源

Thin films of SrB6 were deposited on sapphire substrates using a chemical vapor deposition method, with elemental strontium and decaborane, B10H14, used as the strontium and boron sources, respectively. The formation of highly crystalline, phase-pure SrB6 films was confirmed with X-ray diffraction and reflection high energy diffraction (RHEED) analysis, and the films' thermoelectric transport properties were measured. A relatively high deposition temperature of 850-950 degrees C was found to be optimal for obtaining well-crystallized films at an extremely high deposition rate. The thermoelectric transport properties of the SrB6 thin films were observed to be comparable to those reported for bulk materials, but an unexpectedly high electrical resistivity led to a reduced power factor value for the thin films. (C) 2016 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据