Controlled sputtering of AlN (002) and (101) crystal orientations on epitaxial 3C-SiC-on-Si (100) substrate

出版年份 2016 全文链接

标题

作者

关键词

A1. X-ray diffraction, A3. Polycrystalline deposition, A3. Physical vapor deposition processes, B1. Nitride, B1. Silicon carbide

出版物

Volume 440, Issue -, Pages 76-80

出版商

Elsevier BV

发表日期

2016-02-09

DOI

10.1016/j.jcrysgro.2016.01.037

联系作者

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started