Improvement of Winter Graft Techniques Using Cold Plasma and Plasma-Treated Solution on Cherry Cultures

The description of a new method of winter grafting of sweet cherry varieties Revna is given. The novelty of the method lies in the use of a portable device for generating cold plasma, as well as a plasma-treated solution, developed by the team of authors. It has been established that exposure to cold plasma affects the growth length of Revna cherries by 17-28%, while an increase in the diameter of the root collar by 20-23% was observed. The electrical resistivity in the grafting zone after exposure to plasma or plasma-activated water decreased by an average of 14% compared to the control, which indicated a better fusion of the transport fibers of the rootstocks and scions.

Automated summary

This study introduces a new method of winter grafting for sweet cherry varieties Revna. The use of a portable device for generating cold plasma and a plasma-treated solution enhances the grafting process. The exposure to cold plasma significantly affects the growth of Revna cherries and improves the fusion between the rootstocks and scions.