标题
Thermal rectification in silicon by a graded distribution of defects
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 119, Issue 21, Pages 215102
出版商
AIP Publishing
发表日期
2016-06-07
DOI
10.1063/1.4953142
参考文献
相关参考文献
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