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Defect characterization of β-Ga2O3 single crystals grown by vertical Bridgman method

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JAPANESE JOURNAL OF APPLIED PHYSICS
卷 55, 期 12, 页码 -

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IOP PUBLISHING LTD
DOI: 10.7567/JJAP.55.1202BF

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The characteristics of structural defects observed on (100) wafers in beta-Ga2O3 single crystals grown by directional solidification in a vertical Bridgman furnace were studied in terms of crystal growth conditions. No high-dislocation-density regions near the wafer periphery were observed owing to the lack of adhesion between the as-grown crystal ingot surface and the crucible inner wall, and directional solidification growth in a crucible with a very low temperature gradient resulted in beta-Ga2O3 single crystals with a low mean dislocation density of 2.3 x 10(3) cm(-2) . Line-shaped defects up to 150 mu m long in the [010] direction were detected at a mean density of 0.5 x 10(2) cm(-2), which decreased with decreasing growth rate. The line-shaped defect structure and formation mechanism were discussed. (C) 2016 The Japan Society of Applied Physics

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