Impact of Interlayer and Ferroelectric Materials on Charge Trapping During Endurance Fatigue of FeFET With TiN/Hf
x
Zr1-x
O2/Interlayer/Si (MFIS) Gate Structure
Impact of Interlayer and Ferroelectric Materials on Charge Trapping During Endurance Fatigue of FeFET With TiN/Hf
x
Zr1-x
O2/Interlayer/Si (MFIS) Gate Structure
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