4.6 Article

Application Relevant Evaluation of Trapping Effects in AlGaN/GaN HEMTs With Fe-Doped Buffer

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 63, 期 1, 页码 326-332

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2015.2499313

关键词

Dispersion; gallium nitride (GaN); high electron mobility transistors (HEMTs); semiconductor device doping; trap levels

资金

  1. Swedish Governmental Agency of Innovation Systems
  2. Chalmers University of Technology
  3. Classic WBG Semiconductors AB
  4. Comheat Microwave AB
  5. Ericsson AB
  6. Infineon Technologies Austria AG
  7. Mitsubishi Electric Corporation
  8. Saab AB
  9. SP Technical Research Institute of Sweden
  10. United Monolithic Semiconductors, through the GigaHertz Centre in a Joint Research Project
  11. Research Project entitled Advanced III-Nitrides-Based Electronics for Future Microwave Communication and Sensing Systems through the Swedish Foundation for Strategic Research

向作者/读者索取更多资源

This paper investigates the impact of different iron (Fe) buffer doping profiles on trapping effects in microwave AlGaN/gallium nitride (GaN) high electron mobility transistors (HEMTs). We characterize not only the current collapse due to trapping in the buffer, but also the recovery process, which is important in the analysis of suitable linearization schemes for amplitude modulated signals. It is shown that the simple pulsed dc measurements of current transients can be used to investigate transient effects in the RF power. Specifically, it is revealed that the design of the Fe-doping profile in the buffer greatly influences the recovery time, with the samples with lower Fe concentration showing slower recovery. In contrast, traditional indicators, such as S-parameters and dc as well as pulsed I-V characteristics, show very small differences. An analysis of the recovery shows that this effect is due to the presence of two different detrapping processes with the same activation energy (0.6 eV) but different time constants. For highly doped buffers, the faster process dominates, whereas the slower process is enhanced for less doped buffers.

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