4.8 Article

Multicolor Patterning of 2D Semiconductor Nanoplatelets

期刊

ACS NANO
卷 15, 期 11, 页码 17623-17634

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsnano.1c05400

关键词

colloidal semiconductor nanocrystals; nanopatterning; electron-beam lithography; core/shell nanoplatelets; Langmuir-type self-assembly

资金

  1. Dresden Center for Intelligent Materials (DCIM) by the Free State of Saxony
  2. TU Dresden
  3. [DFG-CRC1415]

向作者/读者索取更多资源

This work focuses on the multicolor patterning of two-dimensional nanoplatelets via self-assembly and direct electron-beam lithography, demonstrating successful fabrication of fluorescent nanoarrays. The fabricated micro/nanoarrays provide an innovative platform for investigating biological interactions and Forster resonance energy transfer.
Nanocrystal micro/nanoarrays with multiplexed functionalities are of broad interest in the field of nanophotonics, cellular dynamics, and biosensing due to their tunable electrical and optical properties. This work focuses on the multicolor patterning of two-dimensional nanoplatelets (NPLs) via two sequential self-assembly and direct electron-beam lithography steps. By using scanning electron microscopy, atomic force microscopy, and fluorescence microscopy, we demonstrate the successful fabrication of fluorescent nanoarrays with a thickness of only two or three monolayers (7-11 nm) and a feature line width of similar to 40 nm, which is three to four NPLs wide. To this end, first, large-area thin films of red-emitting CdSe/ZnyCd1-yS and green-emitting CdSe1-xSx/ZnyCd1-yS core/shell NPLs are fabricated based on Langmuir-type self-assembly at the liquid/air interface. By varying the concentration of ligands in the subphase, we investigate the effect of interaction potential on the film's final characteristics to prepare thin superlattices suitable for the patterning step. Equipped with the ability to fabricate a uniform superlattice with a controlled thickness, we next perform nanopatterning on a thin film of NPLs utilizing a direct electron-beam lithography (EBL) technique. The effect of acceleration voltage, aperture size, and e-beam dosage on the nanopattern's resolution and fidelity is investigated for both of the presented NPLs. After successfully optimizing EBL parameters to fabricate single-color nanopatterns, we finally focus on fabricating multicolor patterns. The obtained micro/nanoarrays provide us with an innovative experimental platform to investigate biological interactions as well as Forster resonance energy transfer.

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