4.8 Article

Layer-by-Layer Growth of AA-Stacking MoS2 for Tunable Broadband Phototransistors

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 13, 期 49, 页码 59154-59163

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.1c19906

关键词

AA-stacking MoS2; layer-by-layer growth; phototransistor; broadband photodetection; gate tunable

资金

  1. National Natural Science Foundation of China [52002254]
  2. Sichuan Science and Technology Foundation [2020YJ0262, 2021YFH0127]
  3. Chunhui plan of Ministry of Education, Fundamental Research Funds for the Central Universities, China [YJ201893]
  4. State Key Lab of Advanced Metals and Materials, China [2019-Z03]

向作者/读者索取更多资源

The study successfully achieved the growth of highly uniform AA-stacking domains in MoS2 by introducing NaCl molecules and controlling the growth time. It was found that the stacking fashion and layer number of MoS2 have a significant impact on photoexcitation and photoresponse, with the tunability of the latter depending on the layer number and photogating effect.
The stacking configuration has been considered as an important additional degree of freedom to tune the physical property of layered materials, such as superconductivity and interlayer excitons. However, the facile growth of highly uniform stacking configuration is still a challenge. Herein, the AA-stacking MoS2 domains with a ratio up to 99.5% has been grown by using the modified chemical vapor deposition through introducing NaCl molecules in the confined space. By tuning the growth time, MoS2 domains would transit from an AA-stacking bilayer to an AAAAA-stacking five-layer. The epitaxial growth mechanism has been insightfully studied, revealing that the critical nucleation size of the AA-stacking bilayer is 5.0 +/- 3.0 mu m. Through investigation of the photoluminescence, the photoemission, especially the indirect photoexcitation, is dependent on both the stacking fashion and layer number. Furthermore, by studying the gate-tuned MoS2 phototransistors, we found a significant dependence on the stacking configuration of MoS2 of the photoexcitation and a different gate tunable photoresponse. The AAA-stacking trilayer MoS2 phototransistor delivers a photoresponse of 978.14 A W-1 at 550 nm. By correction of the external quantum efficiency with external field and illumination power density, it has been found that the photoresponse tunability is dependent on the layer number due to the strong photogating effect. This strategy provides a general avenue for the epitaxial growth of van der Waals film which will further facilitate the applications in a tunable photodetector.

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