Low Temperature Open-Air Plasma Deposition of SrTiO3 Films for Solar Energy Harvesting: Impact of Precursors on the Properties and Performances

Strontium titanate (STO) is a well-known oxide used in a wide variety of applications due to its excellent stability and optoelectronic properties. However, its integration in photoelectrocatalytic devices is limited by the lack of fast and scalable methods to produce robust films at a low temperature and atmospheric pressure. Herein, we report an atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) approach for the synthesis of STO crystalline films and their applications for photoelectrochemical solar energy conversion. The film crystallinity, which plays a determinant role in the photoelectrochemical performance, was linked to the selected strontium precursor and injection method. Through thermal stability studies of the precursors [Sr(dpm), Sr(ipo), Sr(acac), and Ti(ipo)] and analysis of the solution droplet size, it was demonstrated that the closer thermal decomposition behavior and superior miscibility of the Sr(dpm) and Ti(ipo) precursors led to more homogeneous and crystalline films with the highest photoelectrochemical performance (16.5 mu A cm(- 2) at 1.23 V vs RHE under 100 mW cm(-2)), which can be further improved by a factor of 3.4 using thermal annealing at 500 degrees C. Evidence of the impact of a strontium precursor on the properties of STO films is provided through thermogravimetric analysis, X-ray diffraction, energy-dispersive system, UV-vis, X-ray photoelectron spectroscopy, HIM-SIMS, and photoelectrochemical analysis.

Automated summary

This study demonstrates a successful synthesis of strontium titanate (STO) crystalline films using atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) and investigates the impact of strontium precursor and injection method on the film crystallinity and photoelectrochemical performance.