4.8 Article

Charged Particle-Induced Surface Reactions of Organometallic Complexes as a Guide to Precursor Design for Electron- and Ion-Induced Deposition of Nanostructures

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 13, 期 41, 页码 48333-48348

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.1c12327

关键词

electron beam-induced deposition; FEBID; ion beam-induced deposition; FIBID; precursor chemistry; charged particle-induced deposition; 3D nanostructure fabrication

资金

  1. National Science Foundation [CHE-1607621, CHE-1904559, CHE-1607547, CHE1904802]
  2. European Union [722149]

向作者/读者索取更多资源

FEBID and FIBID are direct-write fabrication techniques using focused beams of charged particles. Ultra high vacuum surface science studies provide mechanistic information on electron and ion-induced processes, aiding in the design of custom precursors for these techniques. Minimizing contamination in nanostructures is crucial for many applications.
Focused electron beam-induced deposition (FEBID) and focused ion beam-induced deposition (FIBID) are direct-write fabrication techniques that use focused beams of charged particles (electrons or ions) to create 3D metal-containing nanostructures by decomposing organometallic precursors onto substrates in a low-pressure environment. For many applications, it is important to minimize contamination of these nanostructures by impurities from incomplete ligand dissociation and desorption. This spotlight on applications describes the use of ultra high vacuum surface science studies to obtain mechanistic information on electron-and ion-induced processes in organometallic precursor candidates. The results are used for the mechanism-based design of custom precursors for FEBID and FIBID.

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