4.6 Article

New method of transport measurements on van der Waals heterostructures under pressure

期刊

JOURNAL OF APPLIED PHYSICS
卷 130, 期 6, 页码 -

出版社

AIP Publishing
DOI: 10.1063/5.0058583

关键词

-

资金

  1. Topograph FlagERA network
  2. OTKA grants [FK-123894]
  3. Swiss Nanoscience Institute (SNI)
  4. ERC project Top-Supra [787414]
  5. Swiss National Science Foundation
  6. Swiss NCCR QSIT
  7. Ministry of Innovation and Technology within the Quantum Information National Laboratory of Hungary
  8. National Research, Development and Innovation Office within the Quantum Information National Laboratory of Hungary
  9. Quantum Technology National Excellence Program [2017-1.2.1-NKP-2017-00001]
  10. SuperTop QuantERA network
  11. FET Open AndQC network
  12. COST (European Cooperation in Science and Technology) [CA16218]
  13. Bolyai Fellowship
  14. Elemental Strategy Initiative by the MEXT, Japan [JPMXP0112101001]
  15. JSPS KAKENHI [JP20H00354]
  16. CREST, JST [JPMJCR15F3]

向作者/读者索取更多资源

Interlayer coupling is crucial for the properties of van der Waals heterostructures, strongly depending on the interlayer distance. By conducting transport measurements in piston-cylinder hydrostatic pressure cells, the interlayer coupling can be tuned, while a hexagonal boron nitride capping layer provides protection against pressure medium interference.
The interlayer coupling, which has a strong influence on the properties of van der Waals heterostructures, strongly depends on the interlayer distance. Although considerable theoretical interest has been demonstrated, experiments exploiting a variable interlayer coupling on nanocircuits are scarce due to the experimental difficulties. Here, we demonstrate a novel method to tune the interlayer coupling using hydrostatic pressure by incorporating van der Waals heterostructure based nanocircuits in piston-cylinder hydrostatic pressure cells with a dedicated sample holder design. This technique opens the way to conduct transport measurements on nanodevices under pressure using up to 12 contacts without constraints on the sample at the fabrication level. Using transport measurements, we demonstrate that a hexagonal boron nitride capping layer provides a good protection of van der Waals heterostructures from the influence of the pressure medium, and we show experimental evidence of the influence of pressure on the interlayer coupling using weak localization measurements on a transitional metal dichalcogenide/graphene heterostructure.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据