Optical and structural modification in amorphous Ge24Se61Sb15 thin films under 80 MeV Silicon swift heavy ions for telecom and optical applications
出版年份 2020 全文链接
标题
Optical and structural modification in amorphous Ge24Se61Sb15 thin films under 80 MeV Silicon swift heavy ions for telecom and optical applications
作者
关键词
Thin films, Swift heavy ions, Swanepoel method, Static refractive index, Nonlinear third order susceptibility, Raman measurements
出版物
OPTICAL MATERIALS
Volume 111, Issue -, Pages 110686
出版商
Elsevier BV
发表日期
2020-12-13
DOI
10.1016/j.optmat.2020.110686
参考文献
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