Enhanced Antibacterial Photocatalytic Activity of Porous Few-Layer C3N4

Nowadays, antibacterial photocatalytic activity of semiconductors has attracted great attention due to its excellent stability, good biocompatibility and no disinfection byproducts. Herein, a porous few-layer C3N4 was successfully fabricated via a simple and low-cost bottom-up method. The as-prepared porous few-layer C3N4 exhibits large specific surface areas, which is about 4.8 times than bulk C3N4. Under the light (<430 nm) irradiation, reactive oxygen species (ROS) (singlet oxygen (O-1(2)), hydroxyl radicals ((OH)-O-center dot), and superoxide (O-2(center dot-))) can be generated. The porous few-layer C3N4 was used as an antibacterial agent to kill gram-positive bacterium S. Aureus with an anibacterial efficiency up to 99.7%. The log removal rate of the porous few-layer C3N4 is more than 50 times than the bulk C3N4. The material shows a potential application in water purification and antibacterial photocatalytic therapy.