Growth mechanism of subsurface hydrogen cavities in tungsten exposed to low-energy high-flux hydrogen plasma

标题
Growth mechanism of subsurface hydrogen cavities in tungsten exposed to low-energy high-flux hydrogen plasma
作者
关键词
Tungsten, H plasma, Blistering behavior, Loop punching, Shear loop emission
出版物
ACTA MATERIALIA
Volume 193, Issue -, Pages 19-27
出版商
Elsevier BV
发表日期
2020-05-06
DOI
10.1016/j.actamat.2020.04.012

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