Influence of negative bias voltage on structural and mechanical properties of nanocrystalline TiN x thin films treated in hot cathode arc discharge plasma system

标题
Influence of negative bias voltage on structural and mechanical properties of nanocrystalline TiN x thin films treated in hot cathode arc discharge plasma system
作者
关键词
TiN, Nitriding, Nano-indentation and hot cathode arc discharge plasma
出版物
CERAMICS INTERNATIONAL
Volume 42, Issue 16, Pages 18019-18024
出版商
Elsevier BV
发表日期
2016-08-06
DOI
10.1016/j.ceramint.2016.08.032

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