Characterization of aluminum oxide thin films obtained by chemical solution deposition and annealing for metal–insulator–metal dielectric capacitor applications

标题
Characterization of aluminum oxide thin films obtained by chemical solution deposition and annealing for metal–insulator–metal dielectric capacitor applications
作者
关键词
Aluminum hydroxide, Aluminum oxide, Dielectric layers, Chemical bath deposition, MIM capacitor device
出版物
APPLIED SURFACE SCIENCE
Volume 513, Issue -, Pages 145879
出版商
Elsevier BV
发表日期
2020-02-25
DOI
10.1016/j.apsusc.2020.145879

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