Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma

出版年份 2020 全文链接

标题

作者

关键词

出版物

Volume 38, Issue 2, Pages 023009

出版商

American Vacuum Society

发表日期

2020-01-30

DOI

10.1116/1.5138189

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