Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering
Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering
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