4.5 Article Proceedings Paper

Effect of oxygen partial pressure during pulsed laser deposition on the emission of Eu doped ZnO thin films

期刊

PHYSICA B-CONDENSED MATTER
卷 576, 期 -, 页码 -

出版社

ELSEVIER
DOI: 10.1016/j.physb.2019.411713

关键词

Oxygen partial pressure; ZnO:Eu3+; Pulsed laser deposition

资金

  1. DST, New Delhi, India [DST/INSPIRE/04/2015/001497]
  2. National Research Foundation of South Africa [115126, 84415]
  3. South African Research Chairs Initiative of Department of Science and Technology
  4. Korea Agency for Infrastructure Technology Advancement (KAIA) [115126] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Eu3+ doped ZnO (ZnO:Eu3+) thin films were prepared by pulsed laser deposition at different oxygen partial pressures. The all ZnO:Eu3+ thin films have a hexagonal structure. The morphology and roughness of the ZnO: Eu3+ thin film were also dependent on the partial pressure of the oxygen. The strong band to band emission was observed with the weak emission of both Eu3+ and defects. The intensity of the band emission peaks has increased with an increase in the oxygen partial pressure.

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