Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers

标题
Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers
作者
关键词
Nanocolumnar TiZrN film, OAD, Reactive co-sputtering, Ternary nitride, PVD
出版物
CURRENT APPLIED PHYSICS
Volume 19, Issue 8, Pages 894-901
出版商
Elsevier BV
发表日期
2019-05-12
DOI
10.1016/j.cap.2019.05.002

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