Incorporation of low energy activated nitrogen onto HOPG surface: Chemical states and thermal stability studies by in-situ XPS and Raman spectroscopy

标题
Incorporation of low energy activated nitrogen onto HOPG surface: Chemical states and thermal stability studies by in-situ XPS and Raman spectroscopy
作者
关键词
Graphite, Nitrogen plasma, N, 2, implantation, Thermal stability
出版物
APPLIED SURFACE SCIENCE
Volume 382, Issue -, Pages 192-201
出版商
Elsevier BV
发表日期
2016-04-10
DOI
10.1016/j.apsusc.2016.04.030

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