Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel

标题
Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel
作者
关键词
Metal oxides, Thin films, Film structure, Corrosion, Chemical resistance
出版物
MATERIALS CHEMISTRY AND PHYSICS
Volume 228, Issue -, Pages 285-292
出版商
Elsevier BV
发表日期
2019-02-19
DOI
10.1016/j.matchemphys.2019.02.053

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