Low-damage nitrogen incorporation in graphene films by nitrogen plasma treatment: Effect of airborne contaminants

标题
Low-damage nitrogen incorporation in graphene films by nitrogen plasma treatment: Effect of airborne contaminants
作者
关键词
Graphene, N-incorporation, Downstream plasma treatment, X-ray photoelectron spectroscopy, Raman spectroscopy
出版物
CARBON
Volume 144, Issue -, Pages 532-539
出版商
Elsevier BV
发表日期
2018-12-25
DOI
10.1016/j.carbon.2018.12.095

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