期刊
ACS APPLIED MATERIALS & INTERFACES
卷 11, 期 24, 页码 21675-21685出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.9b02935
关键词
low temperature; ultraviolet (UV); stretchability; hybrid dielectric; thin-film transistor (TFT); indium gallium tin oxide (IGTO)
资金
- MKE/KEIT through the Industrial Strategic Technology Development Program [10079974]
- Samsung Research Funding Center for Future Technology through Samsung Electronics
This paper reports the fabrication of indium gallium tin oxide (IGTO) thin-film transistors (TFTs) with ultraviolet (UV)-treated PVP-co-PMMA-based hybrid gate insulators at an extremely low temperature (<= 150 degrees C). Synergetic hafnia loading and UV treatment were used to tailor the mechanical softness and hydroxyl fraction in the polymer dielectric film. The UV-treated hybrid dielectric film had a low hydroxyl concentration, a smoother surface, and a denser packing nature, which can be explained by the high ionicity of hafnium oxide and photon-assisted improvement in the cohesion between organic and inorganic materials. Suitability of the UV-treated hybrid dielectric film as a gate insulator was evaluated by fabricating bottom gate TFTs with sputtered IGTO films as a channel layer, which showed high carrier mobility at a low temperature. The resulting IGTO TFTs with a UV-treated hybrid gate insulator exhibited a remarkable high field-effect mobility of 25.9 cm(2)/(V s), a threshold voltage of -0.2 V, a subthreshold gate swing of 0.4 V/decade, and an I-ON/OFF ratio of >10(7) even at a low annealing temperature of 150 degrees C. The fabricated IGTO TFTs with the UV -treated hybrid dielectric film on the plastic substrate were shown to withstand the 100 times mechanical bending stress even under an extremely small curvature radius of 1 mm due to the intrinsic stretchability of the hybrid dielectric film.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据