4.4 Article

Electrical Properties of Vertical p-NiO/n-Ga2O3 and p-ZnCo2O4/n-Ga2O3 pn-Heterodiodes

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WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssa.201800729

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-gallium oxides; heterojunction diode; thermal admittance spectroscopy

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  1. European Social Fund (ESF) [SAB 100310460]

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Vertical -Ga2O3-based pn-heterostructures are investigated by current-voltage measurements and thermal admittance spectroscopy. The -Ga2O3 thin films are grown by pulsed laser deposition (PLD) on (00.1)ZnO:Ga/(11.0)Al2O3 substrates at 670 degrees C. Two different p-type oxides are used to fabricate pn-heterodiodes which are investigated with respect to rectification, temperature stability, and breakdown behavior. For that, p-NiO and p-ZnCo2O4 are grown by PLD at room temperature on top of a -Ga2O3 thin film, respectively. The rectification ratio at room temperature is about nine orders of magnitude, the ideality factor is about 2 and the on-resistance is below 1cm(2). Both diode types did not show degradation for temperatures up to 100 degrees C. Thermal admittance spectroscopy revealed defects in -Ga2O3 with thermal activation energy E-a of about 200meV for both diode types. Additionally, a level with E-a approximate to 240meV is detected for the NiO/Ga2O3 diodes only. In general, both diode types are suited to realize pn-heterodiodes with high rectification, but NiO is especially interesting for defect characterization by deep-level optical spectroscopy due to its transparency up to about 3.7eV.

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