Effects of heat treatment and in situ high-temperature X-ray diffraction study on the formation of ferroelectric epitaxial Y-doped HfO2 film

标题
Effects of heat treatment and in situ high-temperature X-ray diffraction study on the formation of ferroelectric epitaxial Y-doped HfO2 film
作者
关键词
-
出版物
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 58, Issue SB, Pages SBBB09
出版商
Japan Society of Applied Physics
发表日期
2019-02-26
DOI
10.7567/1347-4065/aafed1

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