期刊
COMPUTATIONAL MATERIALS SCIENCE
卷 157, 期 -, 页码 132-135出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.commatsci.2018.10.024
关键词
Silicon; Shuffle screw dislocation; Boundaries; Dislocation transmission; Molecular dynamics
资金
- NSF [CMMI-1536925]
- Extreme Science and Engineering Discovery Environment (XSEDE allocations) [TG MSS170003]
- ARO [W911NF-17-1-0225]
- ONR [N00014-16-1-2079]
- ISU (Vance Coffman Faculty Chair Professorship)
In this paper, molecular dynamics (MD) simulations of the interaction between flit grain boundaries (GBs) and a shuffle screw dislocation in silicon are performed. Results show that dislocations transmit into the neighboring grain for all GBs in silicon. For Sigma 3, Sigma 9 and Sigma 19 GBs, when a dislocation interacts with a heptagon site, it transmits the GB directly. In contrast, when interacting with a pentagon site, it first cross slips to a plane on the heptagon site and then transmits the GB. The energy barrier is also quantified using the climbing image nudged elastic band (CINEB) method. Results show that Sigma 3 GB provides a barrier for dislocation at the same level of the Peierls barrier. For both Sigma 9 and Sigma 19 GBs, the barrier from the heptagon sites is much larger than the pentagon sites. Since the energy barrier for crossing all the GBs at the heptagon sites is only slightly larger than the Peierls barrier, perfect screw dislocations cannot pile up against these GBs. Furthermore, the critical shear stress averaged over the whole sample for the transmission through the Sigma 9 and Sigma 19 GBs is almost twice on heptagon site for initially equilibrium dislocation comparing with dislocations moving at a constant velocity.
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