期刊
ADVANCED MATERIALS
卷 28, 期 28, 页码 5939-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201600415
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资金
- National Science Foundation [DMR-1107894]
- Penn State Materials Research Science and Engineering Center - NSF [DMR-0820404, DMR-1420620]
Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 degrees C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors. [GRAPHICS] .
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