期刊
ADVANCED MATERIALS
卷 28, 期 26, 页码 5249-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201600329
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资金
- EC through the European Research Council project SUPRAFUNCTION [GA-257305]
- Marie Sklodowska-Curie ITN project SYNCHRONICS [GA 643238]
- Marie Sklodowska-Curie ITN project iSwitch (GA) [642196]
- Agence Nationale de la Recherche through the LabEx project Chemistry of Complex Systems [ANR-10-LABX-0026_CSC]
- International Center for Frontier Research in Chemistry (icFRC)
- [FP7-NMP-2012-SMALL-6 SACS]
- [GA-310651]
A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.
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