Diffusion-induced grain boundary migration as mechanism for grain growth and defect annihilation in chalcopyrite thin films

出版年份 2016 全文链接

标题

作者

关键词

X-ray diffraction, Physical vapor deposition (PVD), Stacking faults, Grain boundary migration, CuInSe, 2

出版物

Volume 111, Issue -, Pages 377-384

出版商

Elsevier BV

发表日期

2016-04-11

DOI

10.1016/j.actamat.2016.03.073

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