4.8 Article

Toward Plasmonic Tunnel Gaps for Nanoscale Photoemission Currents by On-Chip Laser Ablation

期刊

NANO LETTERS
卷 19, 期 2, 页码 1172-1178

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.8b04612

关键词

Nanoscale gaps; nanoelectronics; ultrafast photoemission; laser ablation; photodetector

资金

  1. Deutsche Forschungsgemeinschaft (DFG) through the priority program 1666
  2. Nanoinitiative Munich (NIM)
  3. cluster eConversion
  4. TUM International Graduate School of Science and Engineering (IGSSE) [GSC 81]
  5. International Max Planck Research School for Quantum Science and Technology (IMPRS-QST)

向作者/读者索取更多资源

We demonstrate that prestructured metal nanogaps can be shaped on-chip to below 10 nm by femtosecond laser ablation. We explore the plasmonic properties and the nonlinear photocurrent characteristics of the formed tunnel junctions. The photocurrent can be tuned from multiphoton absorption toward the laser-induced strong-field tunneling regime in the nanogaps. We demonstrate that a unipolar ballistic electron current is achieved by designing the plasmonic junctions to be asymmetric, which allows ultrafast electronics on the nanometer scale.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据