Interstitial Boron-Doped TiO2 Thin Films: The Significant Effect of Boron on TiO2 Coatings Grown by Atmospheric Pressure Chemical Vapor Deposition

标题
Interstitial Boron-Doped TiO2 Thin Films: The Significant Effect of Boron on TiO2 Coatings Grown by Atmospheric Pressure Chemical Vapor Deposition
作者
关键词
-
出版物
ACS Applied Materials & Interfaces
Volume 8, Issue 38, Pages 25024-25029
出版商
American Chemical Society (ACS)
发表日期
2016-09-14
DOI
10.1021/acsami.6b09560

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