Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self-Limiting Natures and Structural Characteristics of Al2 O3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)

标题
Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self-Limiting Natures and Structural Characteristics of Al2 O3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)
作者
关键词
-
出版物
Advanced Materials Interfaces
Volume 5, Issue 14, Pages 1870070
出版商
Wiley
发表日期
2018-07-23
DOI
10.1002/admi.201870070

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