3.8 Article

One-dimensional CuO nanowire: synthesis, electrical, and optoelectronic devices application

期刊

NANOSCALE RESEARCH LETTERS
卷 9, 期 -, 页码 1-8

出版社

SPRINGER
DOI: 10.1186/1556-276X-9-637

关键词

Surface mechanical attrition treatment (SMAT); Semiconductor nanostructures; The first-principle calculation; Metal oxide; Flexible photodetector

资金

  1. National Key Basic Research Program of the Chinese Ministry of Science and Technology [2012CB932203]
  2. Natural Science Foundation of China (NSFC [51202206, 21101051, 11104080, 61106010]
  3. Croucher Foundation [CityU9500006]
  4. Fundamental Research Funds for the Central Universities [2012HGCX0003, 2013HGCH0012, 2014HGCH0005]

向作者/读者索取更多资源

In this work, we presented a surface mechanical attrition treatment (SMAT)-assisted approach to the synthesis of one-dimensional copper oxide nanowires (CuO NWs) for nanodevices applications. The as-prepared CuO NWs have diameter and the length of 50 similar to 200 nm and 5 similar to 20 mu m, respectively, with a preferential growth orientation along [1 0] direction. Interestingly, nanofield-effect transistor (nanoFET) based on individual CuO NW exhibited typical p-type electrical conduction, with a hole mobility of 0.129 cm(2)V(-1) s(-1) and hole concentration of 1.34 x 10(18) cm(-3), respectively. According to first-principle calculations, such a p-type electrical conduction behavior was related to the oxygen vacancies in CuO NWs. What is more, the CuO NW device was sensitive to visible light illumination with peak sensitivity at 600 nm. The responsitivity, conductive gain, and detectivity are estimated to be 2.0 x 10(2) A W-1, 3.95 x 10(2) and 6.38 x 10(11) cm Hz(1/2) W-1, respectively, which are better than the devices composed of other materials. Further study showed that nanophotodetectors assembled on flexible polyethylene terephthalate (PET) substrate can work under different bending conditions with good reproducibility. The totality of the above results suggests that the present CuO NWs are potential building blocks for assembling high-performance optoelectronic devices.

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