Atmospheric pressure chemical vapor deposition of high silica SiO2-TiO2 antireflective thin films for glass based solar panels

The atmospheric pressure chemical vapor deposition (APCVD) of SiO2-TiO2 thin films on glass by employing a [[((BuO)-Bu-t)(3)SiO](2)-Ti((OPr)-Pr-i)(2)] single-source precursor, which can be prepared from commercially available materials, results in antireflective thin films with high silica SiO2 : TiO2 ratio (i.e. SiO2 > 1) on float glass under industrially relevant manufacturing conditions.