4.6 Article

Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

期刊

JOURNAL OF MATERIALS CHEMISTRY C
卷 1, 期 46, 页码 7681-7691

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c3tc30908h

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资金

  1. NSF [CMMI 0700718, CMMI 1000425]
  2. Nissan Chemical
  3. Div Of Civil, Mechanical, & Manufact Inn
  4. Directorate For Engineering [1000425] Funding Source: National Science Foundation

向作者/读者索取更多资源

This feature article provides an overview of several mechanical-based micro-and nanopatterning technologies that can achieve continuous and high-throughput fabrication of various sub-wavelength structures without resorting to the conventional optical lithography technique. These include a template-based and versatile roll-to-roll nanoimprint lithography technique, cost-effective dynamic mould sweeping patterning as well as mould-free patterning methods. Examples of demonstrated and potential applications in optoelectronics and photonics are also discussed.

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