期刊
IEEE JOURNAL OF PHOTOVOLTAICS
卷 4, 期 3, 页码 772-777出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JPHOTOV.2014.2311233
关键词
Light-trapping; microcrystalline silicon; multi-scale textures; nanoimprint; photovoltaics; thin-film
资金
- European Commission
- Bundesministerium fur Umwelt, Naturschutz und Reaktorsicherheit [03225260 C]
In this study, nanoimprint processing was used to realize various multiscale textures on glass substrates for application in thin-film photovoltaic devices. The multiscale textures are formed by a combination of large and small features, which proofed to be beneficial for light trapping in silicon thin-film solar cells. Two approaches for the fabrication of multiscale textures are presented in this study. In the first approach, the multiscale texture is realized at the lacquer/transparent conductive oxide (TCO) interface, and in the second approach, the multiscale texture is realized at the TCO/Si interface. Various types of multiscale textures were fabricated and tested in microcrystalline thin-film silicon solar cells in p-i-n configuration to identify the optimal texture for the light management. It was found that the best light-scattering multiscale texture was realized using an imprint-textured glass substrate, which contains large craters, in combination with HF-etched TCO (ZnO:Al), which contains small features, on top of the imprint. With this structure (of the second approach), the short-circuit current density of the solar cell devices was improved by 0.6 mA/cm(-2) using multiscale textures realized by nanoimprint processing.
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