Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

标题
Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications
作者
关键词
-
出版物
Advanced Science
Volume 2, Issue 7, Pages 1500016
出版商
Wiley
发表日期
2015-05-07
DOI
10.1002/advs.201500016

向作者/读者发起求助以获取更多资源

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started