N2-Plasma-Assisted One-Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir-Blodgett Technique

标题
N2-Plasma-Assisted One-Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir-Blodgett Technique
作者
关键词
-
出版物
Advanced Materials Interfaces
Volume 2, Issue 5, Pages 1400515
出版商
Wiley
发表日期
2015-02-19
DOI
10.1002/admi.201400515

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