期刊
WATER RESEARCH
卷 44, 期 12, 页码 3703-3713出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.watres.2010.04.006
关键词
Advanced oxidation; Disinfection by-products; Chlorination and ultraviolet
资金
- Water Research Foundation (WaterRF) [4161]
- Water RF
- U.S. Environmental Protection Agency (USEPA)
Ultraviolet (UV) irradiation has become popular as a primary disinfectant because it is very effective against Cryptosporidium and does not directly form regulated disinfection by-products. Higher UV doses and UV advanced oxidation (UV/H2O2) processes are under consideration for the treatment of trace organic pollutants (e.g. pharmaceuticals, personal care products). Despite the disinfection effectiveness of UV light, a secondary disinfectant capable of maintaining a distribution system residual is required to meet current U.S. regulation. This study investigated changes in disinfection by-product (DBP) formation attributed to UV or UV/H2O2 followed by application of free chlorine to quench hydrogen peroxide and provide residual disinfectant. At a UV dose of 1000 mJ/cm(2), trihalomethane (THM) yield increased by up to 4 mu g/mg-C and 13 mu g/mg-C when treated with low and medium pressure UV, respectively. With the addition of hydrogen peroxide, THM yield increased by up to 25 mu g/mg-C (5 mg-H2O2/L) and 37 mu g/mg-C (10 mg-H2O2/L). Although no changes in DBPs are expected during UV disinfection, application of UV advanced oxidation followed by chlorine addition was assessed with regard to impacts on DBP formation. (C) 2010 Elsevier Ltd. All rights reserved.
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